You are in the College of Science and Liberal ArtsCollege of Science and Liberal Arts

Department of Chemistry and Environmental Science

Ellis, Frank B.

Contact Info
Title:
Email: frank.b.ellis@njit.edu
Office: 384
Phone: 973-642-7095
Dept: Chemistry
Webpage:

About Me



Education

  • 1975 – 1983 Harvard University (Cambridge, Massachusetts) - Ph.D. (Chemistry) 1983; A.M. (Chemistry) 1977
  • 1969 & 1972 – 1975 University of Utah (Salt Lake City, Utah) - B.A. (Mathematics and Chemistry), magna cum laude

Courses I Teach

GEN CHEMISTRY II

Research Interests

I am interested in alternative energy production, energy storage, and reduction of energy needs.  In my work I use knowledge from material science, chemistry, physics, mathematics, mechanical engineering, and fluid mechanics.  I have worked on the deposition and characterization of thin film coatings for amorphous silicon solar cells, low emissivity glass, and electrochromic devices.  I have developed new deposition processes and designed research and production equipment to lower costs and improve performance.  I excel at optimizing processes and finding solutions to problems.


Patents

  • Frank B. Ellis, Jr., John E. Van Dine, and Vijay D. Parkhe, Electrochromic Devices and Methods, Patent number: 5,757,537, May 26, 1998.
  • Frank B. Ellis, Jr., John E. Van Dine, and Vijay D. Parkhe, Electrochromic Devices and Methods, Patent number: 5,724,177, March 3, 1998.
  • Frank B. Ellis, Jr., Formation of Tin Oxide Films on Glass Substrates, Patent number: 5,487,784, January 30, 1996.
  • Frank B. Ellis, Jr., Formation of Tin Oxide Films on Glass Substrates, Patent number: 5,393,563, February 28, 1995.
  • Frank B. Ellis, Jr., Alan E. Delahoy, Jonathan Allen, and Hermann Volltrauer, Selective Scribing of Materials, Patent number: 4,696,702, September 29, 1987.
  • Frank B. Ellis, Jr. and Alan E. Delahoy, Method of Depositing Wide Bandgap Amorphous Semiconductor Materials, Patent number: 4,696,702, September 29, 1987.
  • Alan E. Delahoy, Frank B. Ellis, Jr., and Albert Rose, Particulate Semiconductors and Devices, Patent number: 4,625,071, November 25, 1986.

Selected Publications

  • Frank B. Ellis, Jr. and Jim Houghton, Chemical Vapor Deposition of Silicon Dioxide Barrier Layers for Conductivity Enhancement of Tin Oxide Films, J. Material Research 4, 863-872, 1989.
  • Roy G. Gordon, James Proscia, Frank B. Ellis, Jr., and Alan E. Delahoy, Textured Tin Oxide Films Produced by Atmospheric Pressure Chemical Vapor Deposition from Tetramethyltin and Their Usefulness in Producing Light Trapping in Thin Film Amorphous Silicon Solar Cells, Solar Energy Materials 18, 263-281, 1989.
  • F. B. Ellis, Jr., A. E. Delahoy, M. Bohm, J. A. Cambridge, and T. Horning, Experimental and Theoretical Results for Light Trapping in High Efficiency a-Si1-xCx:H/ a-Si:H Solar Cells Prepared on Granular Tin Oxide, Material Research Society Symposia Proceedings 70, 557-562, 1986.
  • F. B. Ellis, Jr. and A. E. Delahoy, Optical Properties of Hydrogenated Amorphous Silicon Based Solar Cells, Solar Energy Materials 13, 109-132, 1986.
  • F. B. Ellis, Jr. and A. E. Delahoy, Chemical Vapor Deposition of Boron-Doped Hydrogenated Amorphous Silicon, Applied. Physics Letters 47, 135-137, 1985.